FEI Nova Nanolab 200 Dualbeam FIB (UNSW)
Contact:
Dr Charlie Kong, Research Associate, Tel: 02 9385 5581.
Example image
Preparation of TEM specimen on interface between electrode and electrolyte in a fuel cell, resulting in an ultrathin section across electrode/electrolyte interface. |
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Capabilities
Advanced microscopy platform comprising high-performance electron and ion columns and analytical detectors for use in 2D and 3D microscopy, materials modification and fabrication of insulators, metals and semiconducting materials.
- Implantation and nano-machining
- Quantum Dots and arrays
- Precise Surface Reconstructions
- Select chemically regions for machining
- Alternate between imaging and nanomilling
- Single atom implantation, device prototyping or selective alloying
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Characterisation
- Nanoscale metrology: characterisation of micro devices (e.g.) recording heads, quantum computer, photonics, semiconductors
- Engineering materials: new insights
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Configuration
- Dual-beam, featuring a scanning electron microscope
- Focussed Ga source for ion machining and milling
- Multi-source
- Analytical capability (EDXS, EBSD)
- Ion energy range: 5 – 30 keV
- Ion beam current range: 1 pA to 20 nA
- Ion beam min. diameter: approx. 10 nm
- Electron column energy range: 0.5 – 30 keV
- Electron column imaging resolution: 1 nm
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